<title>Subwavelength alignment mark signal analysis of advanced memory products

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Subwavelength alignment mark signal analysis of advanced memory products

Published:2000-06-02 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yin Xiaoming,Wong Alfred K. K.,Wheeler Donald C.,Williams Gary,Lehner Eric A.,Zach Franz X.,Kim Byeong Y.,Fukuzaki Yuzo,Lu Zhijian G.,Credendino Santo,Wiltshire Timothy J.

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Impact of the Use of Strongly Absorbing Etch Hard Masks and Shallow Topography to Alignment Signal Strength in 28 nm Technology Nodes and Beyond;ECS Transactions;2019-12-15

2. The Microscope in a Computer: Image Synthesis from Three-Dimensional Full-Vector Solutions of Maxwell’s Equations at the Nanometer Scale;Progress in Optics;2012

3. Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics;The European Physical Journal Applied Physics;2005-04-27

4. Rigorous simulation of alignment for microlithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2003-07-01

5. Ultrafast wafer alignment simulation based on thin film theory;SPIE Proceedings;2002-07-01

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