Deep UV Lithography: Problems And Potential-Reference-Cited by-同舟云学术

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Deep UV Lithography: Problems And Potential

Published:1987-09-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Markle David A.¹

Affiliation:

1. Ultratech Stepper Inc. (United States)

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. UV Transmission and radiation-induced defects in phosphate and fluoride–phosphate glasses;Journal of Non-Crystalline Solids;2000-03

2. Dosage Control for Scanning Exposure with Pulsed Energy Fluctuation and Exposed Position Jitter;Japanese Journal of Applied Physics;1995-12-30

3. UV Optics and Coatings;Ultraviolet Laser Technology and Applications;1995

4. High-performance glass for the deep ultraviolet range;Journal of Non-Crystalline Solids;1994-11

5. Sources, Optics, and Laser Microfabrication Systems for Direct Writing and Projection Lithography;Laser Microfabrication;1989

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