Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering-Reference-Cited by-同舟云学术

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Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering

Published:2015-11-30 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Solovan M. M.,Brus V. V.,Pidkamin L. J.,Maryanchuk P. D.,Dobrovolsky Yu. G.

Publisher

SPIE

Reference29 articles.

1. Characterization of reactively evaporated TiN layers for diffusion barrier applications

2. Kinetic properties of TiN thin films prepared by reactive magnetron sputtering

3. Solovan M.M., Brus V.V., Maystruk E.V., Maryanchuk P.D., Electrical and optical properties of TiN thin films, Inorganic Materials 50, 40–45 (2014).

4. Conductivity and the Hall coefficient of nanostructured titanium nitride films

5. Growth, surface morphology, optical properties and electrical resistivity of ɛ-TiNx (0.4

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of technological conditions on optical and structural properties of molybdenum oxide thin films;Thirteenth International Conference on Correlation Optics;2018-01-18

2. Heterojunction photodiode on cleaved SiC;Thirteenth International Conference on Correlation Optics;2018-01-18

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