Imaging performance of attenuated phase-shift mask using coherent scattering microscope
Author:
Affiliation:
1. Hanyang Univ. (Korea, Republic of)
Publisher
SPIE
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1. An Overview of Optical Systems for 30 nm Resolution;Hudyma,2002
2. Effect of incident angle of off-axis illumination on pattern printability in extreme ultraviolet lithography
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography;Advanced Materials;2020-04-03
2. Mask Materials and Designs for Extreme Ultra Violet Lithography;Electronic Materials Letters;2018-03-21
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