Ion-assisted deposition processes: industrial network IntIon-Reference-Cited by-同舟云学术

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Ion-assisted deposition processes: industrial network IntIon

Published:2004-02-25 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Ehlers Henrik,Becker Karl-Josef,Beckmann Rudolf,Beermann Nils,Brauneck Ulf,Fuhrberg Peter,Gaebler Dieter,Jakobs Stefan,Kaiser Norbert,Kennedy Michael,Koenig Friedrich,Laux Sven,Mueller Juergen Christian,Rau Bernd,Riggers Werner,Ristau Detlev,Schaefer Dieter,Stenzel Olaf

Publisher

SPIE

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomistic Simulation of the Ion-Assisted Deposition of Silicon Dioxide Thin Films;Nanomaterials;2022-09-19

2. Investigation on the reproducibility of optical constants of TiO_2, SiO_2, and Al_2O_3 films, prepared by plasma ion assisted deposition;Optical Materials Express;2015-08-20

3. Postdeposition treatment of IBS coatings for UV applications with optimized thin-film stress properties;Applied Optics;2014-01-03

4. Oxide Coatings: Porous and Dense Films;Optical Coatings;2014

5. Introduction;Optical Coatings;2014

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