New stochastic post-exposure bake simulation method

Author:

Henke Wolfgang

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Comparison of simulation approaches for chemically amplified resists

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3. C. A. Mack ,Inside PROLITH: A Comprehensive Guide to Optical Lithography Simulation, Finle Technologies, Inc., Austin, TX (1997).

4. N. G. van Kampen ,Stochastic Processes in Physics and Chemistry, 2nd ed., Elsevier Science Publishers, New York (1992).

5. A general method for numerically simulating the stochastic time evolution of coupled chemical reactions

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