Double multilayer monochromators for upgraded ESRF beamlines-Reference-Cited by-同舟云学术

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Double multilayer monochromators for upgraded ESRF beamlines

Published:2017-08-23 Issue: Volume: Page:
ISSN:
Container-title:Advances in X-Ray/EUV Optics and Components XII
language:
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Author:

Morawe Christian,Carau Damien,Peffen Jean-Christophe

Publisher

SPIE

Reference13 articles.

1. Multilayers for high heat load synchrotron applications

2. http://www.esrf.eu/UsersAndScience/Experiments/XNP/ID01.

3. http://www.esrf.eu/home/UsersAndScience/Experiments/StructMaterials/ID15A.html.

4. http://www.esrf.eu/UsersAndScience/Experiments/StructMaterials/ID31.

5. An analytical approach to estimating aberrations in curved multilayer optics for hard x-rays: 2 Interpretation and application to focusing experiments

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1. Multilayer Optics for Synchrotron Applications;Advanced Materials Technologies;2024-04-20

2. Preparation and measurement of an x-ray Laue-type monochromator based on a WSi₂/Si multilayer;Applied Optics;2024-04-16

3. Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors;Journal of Synchrotron Radiation;2024-02-09

4. Optimization of the Design and Parameters of a Double-Mirror Monochromator for the Fourth-Generation SKIF Synchrotron Light Source;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-12

5. 大尺寸高性能X射线双通道多层膜反射镜研制;Acta Optica Sinica;2023

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