Author:
Park Jeong-Geun,Kim Sang-wook,Shim Seong-Bo,Suh Sung-Soo,Oh Hye-Keun
Cited by
8 articles.
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1. On the origin and evolution of hotspots in multipatterning processes;Journal of Vacuum Science & Technology B;2023-06-06
2. Etch proximity correction for dense array patterns;DTCO and Computational Patterning;2022-05-26
3. Machine Learning for Mask Synthesis;Machine Learning in VLSI Computer-Aided Design;2019
4. Introducing etch kernels for efficient pattern sampling and etch bias prediction;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-03-06
5. Pattern sampling for etch model calibration;33rd European Mask and Lithography Conference;2017-09-28