First generation laser-produced plasma source system for HVM EUV lithography-Reference-Cited by-同舟云学术

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First generation laser-produced plasma source system for HVM EUV lithography

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Mizoguchi Hakaru,Abe Tamotsu,Watanabe Yukio,Ishihara Takanobu,Ohta Takeshi,Hori Tsukasa,Kurosu Akihiko,Komori Hiroshi,Kakizaki Kouji,Sumitani Akira,Wakabayashi Osamu,Nakarai Hiroaki,Fujimoto Junichi,Endo Akira

Publisher

SPIE

Cited by 38 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development progress of Gigaphoton’s LPP EUV light source for inspection systems;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Liquid Tin Droplet Generator in Laser-Produced Plasma Extreme Ultraviolet Source: A Review;IEEE Transactions on Instrumentation and Measurement;2024

3. Development progress of Sn-LPP EUV light source for inspection systems;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

4. The development of laser-produced plasma EUV light source;Chip;2022-09

5. Key technology development progress of the high power LPP-EUV light source;Optical and EUV Nanolithography XXXV;2022-05-26

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