<title>Precise mask alignment design to crystal orientation of (100) silicon wafer using wet anisotropic etching

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Precise mask alignment design to crystal orientation of (100) silicon wafer using wet anisotropic etching

Published:2000-08-25 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Chen Ping-Hei,Hsieh Chang-Ming,Peng Hsin-Yah,Chyu Minking K.

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Novel fabrication for vertically stacked inverted triangular and diamond-shaped silicon nanowires on (1 0 0) single crystal silicon wafer;Journal of Micromechanics and Microengineering;2019-11-14

2. Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMS;Micro and Nano Systems Letters;2016-06-11

3. Effect of V-groove Side Wall Feature on Epoxy Flow in Passive Alignment of Optical Fiber;Polytronic 2007 - 6th International Conference on Polymers and Adhesives in Microelectronics and Photonics;2007-01

4. Pattern alignment effects in through-wafer bulk micromachining of (100) silicon;2004 IEEE Workshop on Microelectronics and Electron Devices

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