Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference15 articles.
1. International Technology Roadmap for Semiconductors, see http://public.itrs.net/ (2005).
2. C. Yang , “Challenges of mask cost and cycletime,”SEMATECH: Mask Supply Workshop, Intel, Monterey, CA (2001).
3. M. L. Rieger, J. P. Mayhew, and S. Panchapakesan , “Layout design methodologies for sub-wavelength manufacturing,”Proc. Design Auto. Conf. (DAC), pp. 85–92, IEEE/ACM (2001).
4. Resolution enhancement techniques in optical lithography: It's not just a mask problem
5. S. Murphy , “Dupont photomask,”SEMATECH: Mask Supply Workshop, Monterey, CA (2001).
Cited by
19 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献