Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet-Reference-Cited by-同舟云学术

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Published:2016-08-08 Issue:3 Volume:15 Page:033506
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Fallica Roberto¹,Stowers Jason K.²,Grenville Andrew²,Frommhold Andreas³,Robinson Alex P. G.³,Ekinci Yasin¹

Affiliation:

1. Paul Scherrer Institute, 5232 Villigen PSI, Switzerland

2. Inpria Corporation, 2001 NW Monroe Avenue, Suite 203, Corvallis, Oregon 97330, United States

3. University of Birmingham, School of Chemical Engineering, Edgbaston, Birmingham B15 2TT, United Kingdom

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Optical properties of photoresists,2013

2. Parameter extraction for 193 nm chemically amplified resist from refractive index change

3. X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92

4. High absorbing resists based on trifluoromethacrylate-vinyl ether copolymers for EUV lithography

5. Absorbance measurement of polymers at extreme ultraviolet wavelength: Correlation between experimental and theoretical calculations

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