Evaluation of the effect of data quality on the profile uncertainty of critical dimension small angle x-ray scattering-Reference-Cited by-同舟云学术

Evaluation of the effect of data quality on the profile uncertainty of critical dimension small angle x-ray scattering

Published:2016-01-06 Issue:1 Volume:15 Page:014001
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Sunday Daniel F.¹,List Scott²,Chawla Jasmeet S.²,Joseph Kline R.¹

Affiliation:

1. National Institute of Standards and Technology, Materials Science and Engineering Division, 100 Bureau Drive, Gaithersburg, Maryland 20899, United States

2. Intel Corporation, Components Research Division, 2501 NW 229th Avenue, Hillsboro, Oregon 97124, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. Fundamental limits of optical critical dimension metrology: a simulation study

2. Phase sensitive parametric optical metrology: exploring the limits of three-dimensional optical metrology

3. Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus

4. Gaps analysis for CD metrology beyond the 22nm node

5. Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors

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