Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference-Reference-Cited by-同舟云学术

Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference

Published:2016-10-25 Issue:4 Volume:15 Page:044004
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Kagalwala Taher¹,Vaid Alok¹,Mahendrakar Sridhar¹,Lenahan Michael¹,Fang Fang¹,Isbester Paul²,Shifrin Michael³,Etzioni Yoav³,Cepler Aron²,Yellai Naren²,Dasari Prasad²,Bozdog Cornel⁴

Affiliation:

1. GLOBALFOUNDRIES, 400 Stonebreak Road Extension, Malta, New York 12020, United States

2. Nova Measuring Instruments, Inc., 2055 Gateway Pl, STE 480, San Jose, California 95110, United States

3. Nova Measuring Instruments Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

4. ReVera, a Nova Company, 3090 Oakmead Village Drive, Santa Clara, California 95051, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Analysis and applications of optical diffraction by gratings

2. Linewidth measurement of gratings on photomasks: a simple technique

3. Scatterometry as technology enabler for embedded SiGe process

4. Integrated metrology's role in Gas Cluster Ion Beam etch

5. A Combined Gas Cluster Ion Beam (GCIB) and Chemical-Mechanical Polish (CMP) Planarization Scheme for Tungsten Replacement Metal Gate (W-RMG)

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