Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations-Reference-Cited by-同舟云学术

Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations

Published:2016-10-21 Issue:4 Volume:15 Page:044003
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

O’Mullane Samuel¹,Keller Nick²,Diebold Alain C.¹

Affiliation:

1. SUNY Polytechnic Institute, College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

2. Nanometrics, Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics

2. Line-profile and critical-dimension monitoring using a normal incidence optical CD metrology

3. Metrology for directed self-assembly block lithography using optical scatterometry

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