Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process-Reference-Cited by-同舟云学术

Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

Published:2016-03-11 Issue:2 Volume:15 Page:021207
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Kohira Yukihide¹,Kodama Chikaaki²,Matsui Tomomi³,Takahashi Atsushi⁴,Nojima Shigeki²,Tanaka Satoshi²

Affiliation:

1. University of Aizu, School of Computer Science and Engineering, Tsuruga, Ikki-machi, Aizu-Wakamatsu, Fukushima 965-8580, Japan

2. Toshiba Corporation, Semiconductor and Storage Products Company, 2-5-1 Kasama, Sakae-ku, Yokohama 247-8585, Japan

3. Tokyo Institute of Technology, Department of Social Engineering, 2-12-1-W9-98 Ookayama, Meguro-ku, Tokyo 152-8550, Japan

4. Tokyo Institute of Technology, Department of Communications and Computer Engineering, 2-12-1-S3-58 Ookayama, Meguro-ku, Tokyo 152-8550, Japan

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Layout decomposition for double patterning lithography

2. Double patterning layout decomposition for simultaneous conflict and stitch minimization;Yuan,2009

3. A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography;Yang,2010

4. Native-conflict-aware wire perturbation for double patterning technology

5. Optimal layout decomposition for double patterning technology

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