Mass reduction patterning of silicon-on-oxide–based micromirrors-Reference-Cited by-同舟云学术

Mass reduction patterning of silicon-on-oxide–based micromirrors

Published:2016-12-20 Issue:4 Volume:15 Page:045501
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Hall Harris J.¹,Green Andrew²,Dooley Sarah¹,Schmidt Jason D.¹,Starman LaVern A.¹,Langley Derrick³,Coutu Ronald A.³

Affiliation:

1. Air Force Research Laboratory, Sensors Directorate, 2241 Avionics Circle, Building 600, Wright-Patterson Air Force Base, Ohio 45433-7734, United States

2. Air Force Research Laboratory, Sensors Directorate, 2241 Avionics Circle, Building 600, Wright-Patterson Air Force Base, Ohio 45433-7734, United StatesbKBRWyle, 2601 Mission Point Boulevard, Dayton, Ohio 45433, United States

3. Air Force Institute of Technology, Department of Electrical and Computer Engineering, 2950 Hobson Way, Building 641, Wright-Patterson Air Force Base, Ohio 45433-7765, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Resonant biaxial 7-mm MEMS mirror for omnidirectional scanning

2. Optical beamsteering using an 8 × 8 MEMS phased array with closed-loop interferometric phase control

3. Optical raster-scanning displays based on surface-micromachined polysilicon mirrors

4. Design and testing of polysilicon surface-micromachined piston micromirror arrays

5. Vertical stiffening members for flatness control of surface-micromachined structures

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