Investigating printability of native defects on EUV mask blanks through simulations and experiments
Author:
Affiliation:
1. SUNY College of Nanoscale Science and Engineering (United States)
2. SEMATECH Inc. (United States)
Publisher
SPIE
Reference12 articles.
1. The use of EUV lithography to produce demonstration devices
2. Euv lithography at the 22nm technology node;Wood,2010
3. SEMATECH's EUV program: a key enabler for EUVL introduction
4. Investigating the growth of localized defects in thin films using gold nanospheres
5. Progress in the fabrication of low-defect density mask blanks for extreme ultraviolet lithography;Randive,2006
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