<title>Pulsed laser deposition of Y<formula><inf><roman>2</roman></inf></formula>O<formula><inf><roman>3</roman></inf></formula> on Si: characteristics of the interfacial layer

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Pulsed laser deposition of Y<formula><inf><roman>2</roman></inf></formula>O<formula><inf><roman>3</roman></inf></formula> on Si: characteristics of the interfacial layer

Published:2002-08-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Craciun Valentin,Bassim Nabil D.,Howard Joshua M.,Singh Rajiv K.

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of Al2O3/AlN composite ceramics with enhanced performance via a heterogeneous precipitation coating process;Ceramics International;2020-09

2. Electronic Structure and Optical Quality of Nanocrystalline Y2O3 Film Surfaces and Interfaces on Silicon;The Journal of Physical Chemistry C;2014-06-11

3. The preparation and properties of Y2O3/AlN anti-reflection films on chemical vapor deposition diamond;Thin Solid Films;2011-11

4. Structural and optical properties of yttrium trioxide thin films prepared by RF magnetron sputtering;Vacuum;2011-07

5. The properties of the Y2O3 films exposed at elevated temperature;Physica B: Condensed Matter;2011-07

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