Effect of tilt angle and drying temperature on the surface coverage rate of polystyrene nanospheres in evaporation-driven self-assembly process-Reference-Cited by-同舟云学术

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Effect of tilt angle and drying temperature on the surface coverage rate of polystyrene nanospheres in evaporation-driven self-assembly process

Published:2024-02-07 Issue:01 Volume:23 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Ergürhan Ayşe Aygül¹,Şenel Onur²,Yılmaz Elif³,Arpapay Burcu²,Kulakcı Mustafa²,Serincan Uğur²

Affiliation:

1. Eskişehir Technical University, Department of Advanced Technologies, Eskişehir, Turkey

2. Eskişehir Technical University, Department of Physics, Nanoboyut Research Laboratory, Eskişehir, Turkey

3. Eskişehir Technical University, Department of Chemical Engineering, Eskişehir, Turkey

Publisher

SPIE-Intl Soc Optical Eng

Reference38 articles.

1. Advanced colloidal lithography: From patterning to applications

2. Electron beam lithography: resolution limits and applications

3. Focused ion beam technology and applications

4. Imprint Lithography with 25-Nanometer Resolution

5. Nanosphere lithography -- exploiting self-assembly on the nanoscale for sophisticated nanostructure fabrication

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