1. Process Window Discovery Methodology Development for Advanced Lithography;Cross,2016
2. Optimum ArFi Laser Bandwidth for 10nm Node Logic Imaging Performance;Alagna,2015
3. Lower BW and its impact on the patterning performance
4. Improving on-wafer CD correlation analysis using advanced diagnostics and across-wafer light-source monitoring
5. U. Iessi et al. “Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography”, Proc. SPIE 7973, Optical Microlithography XXIV, 797328.