1. The effectiveness of sub 50nm filtration on reduced defectivity in advanced lithography applications;Gotlinsky,2003
2. Research of appropriate filter membrane for reducing defects of ArF lithography;Umeda,2005
3. Study on effective property of point of use filter for defectivity reduction in 75nm ArF lithography and 120nm KrF lithography;Umeda,2006
4. Defect reduction by using point-of-use filtration in new coater/developer;Umeda,2009
5. Filtration condition study for enhanced microbridge reduction;Umeda,2009