1. Development of materials and processes for double patterning toward 32-nm node 193-nm immersion lithography process;Tarutani,2008
2. A Novel Filter Rating Method Using Less Than 30-nm Gold Nanoparticle and Protective Ligand
3. Performance index determination for lithography fluid filters using metal nanoparticle;Umeda,2011
4. Adsorptive retention performance index for NGL process filters;Umeda,2011
5. Application specific ratings for lithography process filters;Umeda,2013