Author:
Sato Hironobu,Seino Yuriko,Kasahara Yusuke,Kodera Katsuyoshi,Miyagi Ken,Shiraishi Masayuki,Azuma Tsukasa
Reference3 articles.
1. Pattern defect reduction and LER improvement of chemo-epitaxy DSA process;Muramatsu,2017
2. Advanced CD=SEM metrology for qualification of DSA patterns using coordinate line epitaxy (COOL) process;Kato,2016
3. A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献