A novel processing platform for post tape out flows-Reference-Cited by-同舟云学术

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A novel processing platform for post tape out flows

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXI
language:
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Author:

Vu Hien T.,Kim Soohong,Word James,Cai Lynn Y.

Publisher

SPIE

Reference5 articles.

1. The prospects for hierarchical data processing with growing complexity of the post-tapeout flow;Schulze,2005

2. Parallel processing approaches in RET and MDP: new hybrid multithreading and distributed technology for optimum throughput in a hierarchical flow;Schulze,2003

3. Distributed hierarchical processing;DePesa,2002

4. Further Developments in Distributed Hierarchical Processing;DePesa,2002

5. Advances in OPC technology and development of ZOPC;Yan,2007

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1. Model-based OPC Extension in OpenILT;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10

2. Checkpointing in EDA application for tapeout operation;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16

3. Multi-objective adaptive source optimization for full chip;Applied Optics;2021-03-15

4. Fast nonlinear compressive sensing lithographic source and mask optimization method using Newton-IHTs algorithm;Optics Express;2019-01-28

5. Maximizing utilization of large-scale mask data preparation clusters;34th European Mask and Lithography Conference;2018-09-19

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