1. Innovation in Computational Lithography Techniques to Enable 7nm and Below;Schulze,2017
2. The prospects for hierarchical data processing with growing complexity of the post-tapeout flow;Schulze,2005
3. Parallel processing approaches in RET and MDP: new hybrid multithreading and distributed technology for optimum throughput in a hierarchical flow;Schulze,2003
4. Ron Bennett and Jody Draney, “Benefits of transitioning from dual processor Intel Xeon E5 remote hosts to single processor Intel Xeon E3 remote hosts for Calibre MTFlex customers”, Mentor internal AppNote ref. MG586035
5. A novel processing platform for post tape out flows