Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing-Reference-Cited by-同舟云学术

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Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing

Published:2015-08-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Agocs Emil,Bodermann Bernd,Burger Sven,Dai Gaoliang,Endres Johannes,Hansen Poul-Erik,Nielson Lars,Madsen Morten H.,Heidenreich Sebastian,Krumrey Michael,Loechel Bernd,Probst Juergen,Scholze Frank,Soltwisch Victor,Wurm Matthias

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Coherent Fourier scatterometry using orbital angular momentum beams for defect detection;Optics Express;2021-01-20

2. Efficient Bayesian inversion for shape reconstruction of lithography masks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-05-05

3. Efficient global sensitivity analysis for silicon line gratings using polynomial chaos;Modeling Aspects in Optical Metrology VII;2019-06-21

4. Solar Cells with Photonic and Plasmonic Structures;Spectroscopic Ellipsometry for Photovoltaics;2018

5. Detection of grating asymmetries by phase-structured illumination;Fifth International Conference on Optical and Photonics Engineering;2017-06-13

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