Author:
Song Ki-Yong,Yoon Kwang-Sub,Choi Sang-Jun,Woo Sang-Gyun,Han Woo-Sung,Lee Jae-Jun,Lee Sang-Kyun,Noh Chang-Ho,Honda Kenji
Cited by
2 articles.
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1. New Photoresist Materials for 157-nm Lithography. Poly[Vinylsulfonyl Fluoride-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] Partially Protected with tert-Butoxycarbonyl;Chemistry of Materials;2003-03-12
2. A New Photoresist Materials for 157nm Lithography-3: Poly [2-hydroxy-3-pinanyl vinyl sulfonate-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)styrene];Journal of Photopolymer Science and Technology;2003