Author:
Iimori H.,Ando S.,Shibasaki Y.,Ueda M.,Kishimura S.,Endo M.,Sasago M.
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference23 articles.
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2. Development of 157 nm positive resists
3. New Resin Systems for 157nm Lithography.
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