CD-SEM distortion quantification for EPE metrology and contour analysis-Reference-Cited by-同舟云学术

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CD-SEM distortion quantification for EPE metrology and contour analysis

Published:2017-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Dillen Harm¹,Kiers Ton¹,Halder Sandip²,Wallow Thomas I.³,van Roey Frieda²

Affiliation:

1. ASML Netherlands B.V. (Netherlands)

2. IMEC (Belgium)

3. ASML Brion (United States)

Publisher

SPIE

Reference7 articles.

1. Yan Borodovsky, 2012 International Workshop on EUV Lithography, Maui, Hi

2. Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes

3. Evaluation of OPC quality using automated edge placement error measurement with CD-SEM;Tabery,2006

4. CD-SEM image-distortion measured by view-shift method;Inoue,2011

5. Compensation of CD-SEM image-distortion detected by View-Shift Method;Inoue,2012

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Trainable die-to-database for large field of view e-beam inspection;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-23

2. Contour based process characterization and modeling for HVM;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

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