Nanopatterning of optical surfaces during low-energy ion beam sputtering-Reference-Cited by-同舟云学术

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Nanopatterning of optical surfaces during low-energy ion beam sputtering

Published:2014-06-27 Issue:6 Volume:53 Page:065108
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Liao Wenlin¹,Dai Yifan¹,Xie Xuhui¹

Affiliation:

1. National University of Defense Technology, College of Mechatronics and Automation, Changsha 410073, ChinabHu’nan Key Laboratory of Ultra-Precision Machining Technology, Changsha 410073, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference24 articles.

1. Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

2. Morphology evolution of fused silica surface during ion beam figuring of high-slope optical components

3. Ion beam figuring for lithography optics

4. Large area smoothing of surfaces by ion bombardment: fundamentals and applications

5. Evolution of surface roughness in silicon X-ray mirrors exposed to a low-energy ion beam

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface roughness evolution mechanism of the optical aluminum 6061 alloy during low energy Ar+ ion beam sputtering;Optics Express;2020-10-26

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