Edge placement errors in EUV from aberration variation

Author:

Raghunathan Ananthan,Lam Michael C.,Fenger Germain L.,Sturtevant John L.,Clifford Chris,Adam Kostas

Publisher

SPIE

Reference14 articles.

1. A study on the automation of scanner matching;He,2013

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3. Impact of topographic mask models on scanner matching solutions;Tyminski,2014

4. Scanner matching using pupil intensity control between scanners in 30 nm DRAM devices;Jang,2011

5. CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography;Hwang,2017

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