Performance of new high-power HVM LPP-EUV source-Reference-Cited by-同舟云学术

Performance of new high-power HVM LPP-EUV source

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
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Author:

Mizoguchi Hakaru¹,Nakarai Hiroaki¹,Abe Tamotsu¹,Nowak Krzysztof M.¹,Kawasuji Yasufumi¹,Tanaka Hiroshi¹,Watanabe Yukio¹,Hori Tsukasa¹,Kodama Takeshi¹,Shiraishi Yutaka¹,Yanagida Tatsuya¹,Yamada Tsuyoshi¹,Yamazaki Taku¹,Okazaki Shinji¹,Saitou Takashi¹

Affiliation:

1. Gigaphoton Inc. (Japan)

Publisher

SPIE

Reference17 articles.

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2. Nikon EUVL development progress update;Takaharu,2008

3. EUV into production with ASML’s NXE platform;Christian,2010

4. Performance validation of ASML’s NXE:3100;Christian,2011

5. ASML’s NXE platform performance and volume Introduction;Peeters,2013

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