Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM-Reference-Cited by-同舟云学术

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Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Published:2021-10-13 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2021
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Author:

Mizoguchi Hakaru,Tomuro Hiroaki,Nishimura Yuichi,Hosoda Hirokazu,Nakarai Hiroaki,Abe Tamotsu,Tanaka Hiroshi,Watanabe Yukio,Shiraishi Yutaka,Yanagiga Tatsuya,Soumagne Georg,Iwamoto Fumio,Nagai Shinji,Ueno Yoshifumi,Suganuma Takashi,Niimi Gouta,Yabu Takayuki,Yamada Tsuyoshi,Saitou Takashi

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 用于极紫外光刻的高功率能量回收型自由电子激光光源;Chinese Journal of Lasers;2024

2. Generalized longitudinal strong focusing in a steady-state microbunching storage ring;Physical Review Accelerators and Beams;2023-11-13

3. The development of laser-produced plasma EUV light source;Chip;2022-09

4. 极紫外光刻光源的研究进展及发展趋势;Laser & Optoelectronics Progress;2022

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