Thermomechanical behavior of EUV pellicle under dynamic exposure conditions-Reference-Cited by-同舟云学术

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Thermomechanical behavior of EUV pellicle under dynamic exposure conditions

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Goldfarb Dario L.¹,Bloomfield Max O.²,Colburn Matthew³

Affiliation:

1. IBM Thomas J. Watson Research Ctr. (United States)

2. Rensselaer Polytechnic Institute (United States)

3. IBM Corp. (United States)

Publisher

SPIE

Reference25 articles.

1. Is extreme ultraviolet pellicle possible? - in terms of heat absorption;Kim,2012

2. Temperature behavior of pellicles in extreme ultraviolet lithography

3. Investigation of EUV pellicle feasibility;Scaccabarozzi,2013

4. Grid-supported EUV pellicles: A theoretical investigation for added value;Dhalluin,2015

5. Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity;Kim,2015

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of EUV pellicle deflection and mechanical stress within EUV inner pod under vacuum activity;Vacuum;2023-10

2. Enhancing infrared emissivity of thin films through multilayer configurations;Journal of the Korean Physical Society;2023-09-28

3. Study on ZrSi2 as a Candidate Material for Extreme Ultraviolet Pellicles;Membranes;2023-08-14

4. Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography;Membranes;2022-03-26

5. Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-02-01

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