Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer-Reference-Cited by-同舟云学术

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Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Advanced Etch Technology for Nanopatterning VII
language:
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Author:

Papavieros George,Lorusso Gian F.,Rutigliani Vito,van Roey Frieda,Gogolides Evangelos,Constantoudis Vassilios

Publisher

SPIE

Reference18 articles.

1. Whitehouse, D., [Surfaces and their Measurement], Taylor Hobson Ltd, London (2002)

2. Characterisation of Areal Surface Texture

3. ISO 13565:1996, Geometrical Product Specifications (GPS) — Surface texture: Profile method; Surfaces having stratified functional properties

4. ISO 25178:2016, Geometrical product specifications (GPS) — Surface texture: Areal

5. CD-SEM measurement line-edge roughness test patterns for 193-nm technology;Bunday,2003

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry;Measurement Science and Technology;2020-07-13

2. Line edge roughness metrology: recent challenges and advances toward more complete and accurate measurements;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-10-13

3. Automated rough line-edge estimation from SEM images using deep convolutional neural networks;Photomask Technology 2018;2018-10-03

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