Abstract
Abstract
Optical inspection of periodic nanostructures is a major challenge in the semiconductor industry due to constantly decreasing critical dimensions. In this paper we combine coherent Fourier scatterometry (CFS) with a sectioning mask for subwavelength grating parameter determination. By selecting only the most sensitive regions of the scattered light in the Fourier plane, one can retrieve grating parameters faster and with higher sensitivity than previous approaches. Moreover, the full process of CFS using focused light is explained and implemented in a subwavelength grating regime. The results of using transverse magnetic polarized input fields together with the proposed sectioning mask are presented and compared to the non-mask case.
Funder
H2020 Marie Skłodowska-Curie Actions
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference22 articles.
1. Optical inspection of hidden MEMS structures;Krauter;Proc. SPIE,2017
2. Spectroscopy of scattered light for the characterization of micro and nanoscale objects in biology and medicine;Turzhitsky;Appl. Spectrosc.,2004
3. Performance analysis of coherent Fourier scatterometry;El Gawhary;Appl. Phys.,2011
4. Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer;Constantoudis;Proc. SPIE,2018
5. Scatterometry—fast and robust measurements of nano-textured surfaces;Madsen;Surf. Topogr. Metrol. Prop.,2016
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