Author:
Erdmann Andreas,Mesilhy Hazem M. S.,Evanschitzky Peter,Philipsen Vicky,Timmermans Frank,Bauer Markus
Cited by
2 articles.
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1. Study of novel EUVL mask absorber candidates;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-03
2. Mask absorber for next generation EUV lithography;Extreme Ultraviolet Lithography 2020;2020-10-20