1. Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer;Seshadri,2017
2. EUV patterning successes and frontiers;Felix,2016
3. Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques;Crouse,2017
4. Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs;Kim,2016
5. Investigation of alternate mask absorbers in EUV lithography;Burkhardt,2017