Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists-Reference-Cited by-同舟云学术

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Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
Short-container-title:

Author:

Castellanos Ortega Sonia,Wu Lianjia,Baljozovic Milos,Portale Giuseppe,Kazazis Dimitrios,Vockenhuber Michaela,Ekinci Yasin,Jung Thomas

Publisher

SPIE

Reference34 articles.

1. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning;Ashby,2015

2. Recent EUV Resists toward High Volume Manufacturing;Nakagawa,2014

3. Extreme ultraviolet resist materials for sub-7 nm patterning;Li,2017

4. Improvements in resist performance towards EUV HVM;Yildirim,2017

5. Absorption and exposure kinetics of photoresists at EUV;Fallica,2017

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Zn-Ti oxo cluster photoresists for EUV Lithography: Cluster structure and lithographic performance;Chemical Engineering Journal;2024-08

2. Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking;Chemistry of Materials;2024-02-01

3. Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses;Nanoscale Advances;2024

4. Predicting photoresist sensitivity using machine learning;Bulletin of the Korean Chemical Society;2023-08-23

5. Theoretical Insights into the Solubility Polarity Switch of Metal–Organic Nanoclusters for Nanoscale Patterning;Small Methods;2023-06-19

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