Full-chip characterization of compression algorithms for direct-write maskless lithography systems

Author:

Dai Vito

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Advanced low-complexity compression for maskless lithography data

2. Lossless compression techniques for maskless lithography data

3. V. Dai , “Binary lossless layout compression algorithms and architectures for direct-write lithography systems,” MS Thesis, Department of Electrical Engineering and Computer Sciences, University of California–Berkeley; see 〈http://www-video.eecs.berkeley.edu/papers/vdai/ms-thesis.pdf〉 (2000).

4. Lossless layout compression for maskless lithography systems

5. Reduced complexity compression algorithms for direct-write maskless lithography systems

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