Reduced complexity compression algorithms for direct-write maskless lithography systems-Reference-Cited by-同舟云学术

Reduced complexity compression algorithms for direct-write maskless lithography systems

Published:2007-01-01 Issue:1 Volume:6 Page:013007
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Liu Hsin-I

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Lossless layout compression for maskless lithography systems

2. ITRS,International Technology Roadmap for Semiconductors 2005 Edition – Lithography, see http://www.itrs.net

3. K. Chang, S. Pamarti, K. Kaviani, E. Alon, X. Shi, T. J. Chin, J. Shen, G. Yip, C. Madden, R. Schmitt, C. Yuan, F. Assaderaghi, and M. Horowitz , “Clocking and circuit design for a parallel I/O on a first-generation CELL processor,”IEEE Intl. Solid-State Circuit Conf., Digest of Technical Papers, vol. 1, pp 526–615 (2005).

4. Advanced low-complexity compression for maskless lithography data

5. The LOCO-I lossless image compression algorithm: principles and standardization into JPEG-LS

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