SLITS simulator: modeling and simulation of e‐beam/deep‐ultraviolet exposure and silylation
Author:
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Nanostructure patterns for Shipley SPR505A resist using PRIME process;SPIE Proceedings;2002-07-15
2. PRIME process with Shipley SPR505A resist—simulations and experiments;Microelectronic Engineering;2002-07
3. Modelling and simulations for 40nm lines/spaces in 1μm Shipley SPR510A resist using PRIME process;Microelectronics Journal;2001-08
4. STIL II: photoresist silylation simulation using 2D finite element analysis and boundary movement algorithms;SPIE Proceedings;2001-04-26
5. Photoresist silylation and "swelling": simulation using finite element analysis and physical boundary movement algorithms;SPIE Proceedings;1999-06-11
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