Author:
Arshak K,Arshak A,Mihov M,McDonagh D
Reference16 articles.
1. Sub 35nm metal gratings fabricated using PMMA with high contrast developers;Thoms;Microelecron. Engng,1998
2. Positive resist image by dry etching: new dry developed positive working system for electron beam and deep ultraviolet lithography;Pierrat;J. Vac. Sci. Techol.,1989
3. SAMPLE 1.7a, University of California, Berkeley, 1 March 1989.
4. I. Adesida, Electron energy dissipation in layered media, PhD Thesis, Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, 1979.
5. SLITS simulator: modelling and simulation of ebeam/deep-ultraviolet exposure and silylation;McDonagh;Opt. Engng,1996
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献