Ta2O5/ Al2O3/ SiO2 - antireflective coating for non-planar optical surfaces by atomic layer deposition
Author:
Affiliation:
1. Friedrich-Schiller-Univ. Jena (Germany)
2. Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Publisher
SPIE
Reference10 articles.
1. Optical coatings deposited by ion and plasma PVD processes
2. A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition
3. Introducing atomic layer epitaxy for the deposition of optical thin films
4. Titanium oxide/aluminum oxide multilayer reflectors for “water-window” wavelengths
5. Atomic layer deposition of Al_2O_3 and TiO_2 multilayers for applications as bandpass filters and antireflection coatings
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