Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope-Reference-Cited by-同舟云学术

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Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

Published:2015-02-23 Issue:1 Volume:14 Page:013507
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Benk Markus P.¹,Miyakawa Ryan H.¹,Chao Weilun¹,Wang Yow-Gwo²,Wojdyla Antoine¹,Johnson David G.¹,Donoghue Alexander P.¹,Goldberg Kenneth A.¹

Affiliation:

1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, United States

2. University of California, Department of EECS, Berkeley, California 94720, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Zone plate-based extreme ultraviolet mask microscope with through-pellicle imaging capability;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-08-20

2. Zernike phase-contrast full-field transmission X-ray nanotomography for 400 micrometre-sized samples;Journal of Synchrotron Radiation;2020-10-21

3. Nanometer resolution optical coherence tomography using broad bandwidth XUV and soft x-ray radiation;Scientific Reports;2016-02-10

4. New ways of looking at masks with the SHARP EUV microscope;SPIE Proceedings;2015-03-16

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