New ways of looking at masks with the SHARP EUV microscope-Reference-Cited by-同舟云学术

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New ways of looking at masks with the SHARP EUV microscope

Published:2015-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Goldberg Kenneth A.,Benk Markus P.,Wojdyla Antoine,Johnson David G.,Donoghue Alexander P.

Publisher

SPIE

Reference39 articles.

1. An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm;Goldberg,2011

2. The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope;Goldberg,2013

3. Commissioning an EUV mask microscope for lithography generations reaching 8 nm;Goldberg,2013

4. Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope;Goldberg,2014

5. Asynchrotron-based Fourier-synthesis custom-coherence illuminator;Naulleau,2004

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation;Light: Science & Applications;2024-08-19

2. Exceeding the limits of algorithmic self-calibrated aberration recovery in Fourier ptychography;Optics Continuum;2023-01-03

3. Extreme ultraviolet microscope characterization using photomask surface roughness;Scientific Reports;2020-07-15

4. Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19

5. Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication;Optics Communications;2017-11

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