Overlay accuracy investigation for advanced memory device-Reference-Cited by-同舟云学术

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Overlay accuracy investigation for advanced memory device

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Lee Honggoo,Lee Byongseog,Han Sangjun,Kim Myoungsoo,Kwon Wontaik,Park Sungki,Choi DongSub,Lee Dohwa,Jeon Sanghuck,Lee Kangsan,Volkovich Roie,Itzkovich Tal,Herzel Eitan,Wagner Mark,Elkodadi Mohamed

Publisher

SPIE

Reference11 articles.

1. Overlay accuracy fundamentals;Kandel,2012

2. Overlay quality metric;Cohen,2012

3. Overlay accuracy calibration;Amit,2013

4. Quality metric for accurate overlay control in <20nm nodes;Klein,2013

5. Multi-level overlay techniques for improving DPL overlay control;Chen,2012

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effective tool induced shift (eTIS) for determining the total measurement uncertainty (TMU) in overlay metrology;Metrology, Inspection, and Process Control XXXVII;2023-04-27

2. ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control;Metrology, Inspection, and Process Control XXXVII;2023-04-27

3. Quantifying imaging performance bounds of extreme dipole illumination in high NA optical lithography;SPIE Proceedings;2016-10-03

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