Improving process and system for EUV coat-develop track-Reference-Cited by-同舟云学术

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Improving process and system for EUV coat-develop track

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Harumoto Masahiko,Stokes Harold,Thouroude Yan,Miyagi Tadashi,Kaneyama Koji,Pieczulewski Charles,Asai Masaya

Publisher

SPIE

Reference10 articles.

1. Selete’s EUV program: progress and challenges;Mori,2008

2. Insertion Strategy for EUV Lithography;Wood,2012

3. Investigation of coat-develop track system for EUV resist processing;Harumoto,2013

4. Coat-develop track process for inorganic EUV resist;Harumoto,2012

5. Study of post-develop defect on typical EUV resist;Harumoto,2011

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Progress and process improvements for multiple electron-beam direct write;Japanese Journal of Applied Physics;2017-05-22

2. LWR and defectivity improvement on EUV track system;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18

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