LWR and defectivity improvement on EUV track system-Reference-Cited by-同舟云学术

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LWR and defectivity improvement on EUV track system

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Harumoto Masahiko¹,Stokes Harold²,Thouroude Yan²,Kaneyama Koji¹,Pieczulewski Charles¹,Asai Masaya¹

Affiliation:

1. SCREEN Semiconductor Solutions Co., Ltd. (Japan)

2. SCREEN SPE Germany GmbH (Germany)

Publisher

SPIE

Reference14 articles.

1. Selete’s EUV program: progress and challenges;Mori,2008

2. Insertion Strategy for EUV Lithography;Wood,2012

3. Improving Process and System for EUV Coat-Develop Track;Harumoto,2015

4. EUV resist dissolution optimization for CD uniformity and defect control in coat develop track process;Harumoto,2014

5. Investigation of coat-develop track system for EUV resist processing;Harumoto,2013

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Defect recognition in line-space patterns aided by deep learning with data augmentation;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-09-24

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